IRFB4110PBF vs IPP022N12NM6AKSA1 Ikinahambing
Detalyadong pagkakahiwalay na pagkakahambing ng IRFB4110PBF sa pamamagitan ng Infineon at IPP022N12NM6AKSA1 sa pamamagitan ng Infineon. Ikinahambing ang mga pangunahing paglalarawan, mga tama ng elektriko, paakay, kalagayan ng buhay, presyo, at pagkakaroon upang makita ang pinakamahusay na komponente para sa iyong mga kinakailangang pang disenyo.
Pagsanggunian na paghahambing
| Parametro | IRFB4110PBF | IPP022N12NM6AKSA1 |
|---|---|---|
| Brand | Infineon | Infineon |
| Kategorya | MOSFETs | MOSFETs |
| Katayuan ng Lifecycle | Aktibo | Aktibo |
| Katayuan ng Stock | In Stock | — |
| Presyo ng Yunit (USD) | $1.55 | — |
| Uri ng Transistor | N-Channel MOSFET | — |
| Drain-Source Voltage (VDS) | 100 V | 120 V |
| Continuous Drain Current (ID) at TC=25°C | 120 A (bond-wire limited) | — |
| Pulsed Drain Current (IDM) | [DATA_NEEDED: pulsed drain current] | — |
| Gate-Source Voltage (VGS) max | ±20 V | — |
| Gate Threshold Voltage (VGS(th)) | [DATA_NEEDED: VGS(th) typical/min/max] | [DATA_NEEDED: VGS(th) typical value] |
| On-Resistance RDS(on) max at VGS=10V | 4.5 mΩ | — |
| On-Resistance RDS(on) typ at VGS=10V | 3.7 mΩ | — |
| Power Dissipation (PD) at TC=25°C | 370 W | 395 W |
| Temperature ng Junction na Operasyon | -55 °C to +175 °C | — |
| Packhaging | TO-220AB (through-hole) | PG-TO220-3-1 (TO-220 through-hole) |
| Technology | HEXFET (planar DMOS) | OptiMOS 6 (N-channel trench MOSFET) |
| Uri ng Pagpapasok | Through Hole | Through Hole |
| Tindminan RoHS | Compliant (Pb-free suffix) | Compliant |
| Lead-Free | Yes (PBF suffix denotes Pb-free) | — |
| Continuous Drain Current (ID) at TA=25°C | — | 29 A |
| Pulsed Drain Current (IDM) at TC=25°C | — | 203 A |
| Static Drain-Source On-Resistance (RDS(on)) max | — | 2.2 mΩ |
| Total Gate Charge (Qg) | — | [DATA_NEEDED: Qg typical value] |
| Power Dissipation (PD) at TA=25°C | — | 3.8 W |
| Hanay ng Temperature na Operasyon | — | -55°C to +175°C |
| Bilang ng Pin | — | 3 (Gate, Drain, Source) |
| Manufacturer | — | Infineon Technologies |